- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/507 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
Patent holdings for IPC class C23C 16/507
Total number of patents in this class: 129
10-year publication summary
|
20
|
2
|
15
|
7
|
14
|
5
|
4
|
3
|
8
|
3
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Applied Materials, Inc. | 16587 |
20 |
| Tokyo Electron Limited | 11599 |
19 |
| Lam Research Corporation | 4775 |
10 |
| Sio2 Medical Products, Inc. | 199 |
6 |
| Kokusai Electric Corporation | 1791 |
5 |
| Mitsubishi Heavy Industries, Ltd. | 8217 |
4 |
| ASM IP Holding B.V. | 1715 |
4 |
| Eugene Technology Co., Ltd. | 171 |
4 |
| Hitachi High-Tech Corporation | 4424 |
4 |
| ULVAC, Inc. | 1448 |
3 |
| Texas Instruments Incorporated | 19376 |
2 |
| Varian Semiconductor Equipment Associates, Inc. | 1282 |
2 |
| Sumitomo Chemical Company, Limited | 8808 |
2 |
| Canon Anelva Corporation | 676 |
2 |
| Evatec AG | 152 |
2 |
| Nanyang Technological University | 1739 |
2 |
| SAMCO, Inc. | 17 |
2 |
| Southwest Research Institute | 791 |
2 |
| Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | 6132 |
2 |
| Samsung Electronics Co., Ltd. | 131630 |
1 |
| Other owners | 31 |